Illumination of New Kokugikan Building
نویسندگان
چکیده
منابع مشابه
Application of Improved Illumination Invariance Algorithm in Building Detection
The problem of edge-based classification of natural video sequences containing buildings and captured under changing lighting conditions is addressed. The introduced approach is derived from two empiric observations: In static regions the likelihood of finding features that match the patterns of “buildings” is high because buildings are rigid static objects, and misclassification can be reduced...
متن کاملApplication of Improved Illumination Invariance Algorithm in Building Detection
The problem of edge-based classification of natural video sequences containing buildings and captured under changing lighting conditions is addressed. The introduced approach is derived from two empiric observations: In static regions the likelihood of finding features that match the patterns of “buildings” is high because buildings are rigid static objects, and misclassification can be reduced...
متن کاملApplication of Improved Illumination Invariance Algorithm in Building Detection
The problem of edge-based classification of natural video sequences containing buildings and captured under changing lighting conditions is addressed. The introduced approach is derived from two empiric observations: In static regions the likelihood of finding features that match the patterns of “buildings” is high because buildings are rigid static objects, and misclassification can be reduced...
متن کاملon the comparison of keyword and semantic-context methods of learning new vocabulary meaning
the rationale behind the present study is that particular learning strategies produce more effective results when applied together. the present study tried to investigate the efficiency of the semantic-context strategy alone with a technique called, keyword method. to clarify the point, the current study seeked to find answer to the following question: are the keyword and semantic-context metho...
15 صفحه اولAdvanced mask aligner lithography: new illumination system.
A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatia...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of the Illuminating Engineering Institute of Japan
سال: 1985
ISSN: 0019-2341,1349-838X,2185-1506
DOI: 10.2150/jieij1980.69.9_510